Process for preparing quantum dot array and quantum dot superlattice
US9917218B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Feb 6, 2014 |
| Grant date | Mar 13, 2018 |
| Priority date | — |
| Expiry date | Feb 6, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/146
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention presents a process for preparing a quantum dot array comprising at least the steps of: (a) providing a crystalline semiconductor substrate surface; (b) depositing quantum dots on the said substrate surface by a process of successive ionic layer adsorption and reaction (SILAR). The steps can be repeated to build up a quantum dot superlattice structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.