Patent · US Active

Process for preparing quantum dot array and quantum dot superlattice

US9917218B2 · kind B2 · utility

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19Claims
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Assignee

Inventors

Key dates

Filing dateFeb 6, 2014
Grant dateMar 13, 2018
Priority date
Expiry dateFeb 6, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F77/146
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present invention presents a process for preparing a quantum dot array comprising at least the steps of: (a) providing a crystalline semiconductor substrate surface; (b) depositing quantum dots on the said substrate surface by a process of successive ionic layer adsorption and reaction (SILAR). The steps can be repeated to build up a quantum dot superlattice structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.