Methods of preparing nanodevices
US9919921B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 26, 2015 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Jul 18, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to novel nano- and micro-electromechanical devices and novel methods of preparing them. In one aspect, the invention includes methods of preparing a nanodevice. In certain embodiments, the methods comprise coating a polymer layer with a first at least one thin solid material layer using atomic layer deposition (ALD), thus forming an ALD-generated layer. In other embodiments, the methods comprise patterning the first at least one thin solid material layer to form a nanodevice. In yet other embodiments, the methods comprise releasing the nanodevice from the polymer layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.