Patent · US Active

Methods of preparing nanodevices

US9919921B2 · kind B2 · utility

2Cited by
0References
44Claims
0Family size

Assignees

Inventors

Key dates

Filing dateJan 26, 2015
Grant dateMar 20, 2018
Priority date
Expiry dateJul 18, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention relates to novel nano- and micro-electromechanical devices and novel methods of preparing them. In one aspect, the invention includes methods of preparing a nanodevice. In certain embodiments, the methods comprise coating a polymer layer with a first at least one thin solid material layer using atomic layer deposition (ALD), thus forming an ALD-generated layer. In other embodiments, the methods comprise patterning the first at least one thin solid material layer to form a nanodevice. In yet other embodiments, the methods comprise releasing the nanodevice from the polymer layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.