Method for manufacturing methyl fluoride
US9919990B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2014 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Aug 7, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C17/093
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An object of the present invention is to provide a method for producing methane fluoride that is useful, for example, as a dry etching gas, the method being more suitable for industrial production. To achieve this object, the present invention provides a method including reacting (A) dimethyl sulfate and (B) at least one fluorocompound in a liquid phase, the fluorocompound (B) being at least one compound selected from the group consisting of hydrogen fluoride and hydrofluoric acid salts, or a metal fluoride, wherein when the fluoride compound (B) includes hydrogen fluoride or a hydrofluoric acid salt, the reaction is carried out without a solvent or using a polar solvent as a solvent, and when the fluoride compound (B) is a metal fluoride, the reaction is carried out using water as a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.