Patent · US Active

Process for production of halosilanes from silicon-containing ternary intermetallic compounds

US9920079B2 · kind B2 · utility

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17Claims
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Key dates

Filing dateNov 6, 2015
Grant dateMar 20, 2018
Priority date
Expiry dateNov 6, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B33/1071
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process for preparing a reaction product including a halosilane includes: contacting an unsaturated hydrocarbyl halide and a ternary intermetallic compound at a temperature of 300° C. to 700° C. to form the reaction product. The ternary intermetallic compound includes copper, silicon and a transition metal. The halosilane in the reaction product has formula R1mR2n—HoSiX(4−m−n−o)> where each R1 is independently a saturated monovalent hydrocarbyl group, each R2 is independently an unsaturated monovalent hydrocarbyl group; each X is independently a halogen atom; subscript m is 1, 2, or 3; subscript n is 0, 1, or 2; subscript o is 0, 1, or 2; and a quantity (m+n+o) is 1, 2, or 3. At least a portion of the unsaturated hydrocarbyl groups in the unsaturated hydrocarbyl halide are converted to saturated hydrocarbyl groups (R1) in the halosilane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.