Maskless exposure method and a maskless exposure device for performing the exposure method
US9921488B2 · kind B2 · utility
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1References
12Claims
0Family size
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Key dates
| Filing date | Feb 3, 2015 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Aug 1, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70391
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.