Array substrate, manufacturing method therefor and display device
US9922996B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 29, 2013 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Jun 23, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13685
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An array substrate is provided. The array substrate includes a base substrate, and a buffer layer, a semiconductor layer, a gate insulation layer, a gate metal layer, an interlayer dielectric layer, a source/drain metal layer and a pixel electrode layer that are subsequently formed on the base substrate, and a common electrode layer formed between the base substrate and the buffer layer. The array substrate has an increased storage capacitance and an improved maintenance ratio of pixel voltage, suppresses the unfavorable phenomenon like flicker of the display device. A method for manufacturing an array substrate and a display device including such an array substrate are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.