Patent · US Active

Method for fabricating a photosensitive device

US9923106B2 · kind B2 · utility

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18Claims
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Key dates

Filing dateMay 12, 2014
Grant dateMar 20, 2018
Priority date
Expiry dateMay 12, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/52

Abstract

A method for fabricating a photosensitive device, comprising: a first step of preparing, on a substrate, at least a first photosensitive portion, active within a range of wavelengths, the first portion being surrounded by a second portion that is inactive. A material, covering the first portion, is selectively arranged into a hydrophilic layer by an electrochemical process. The second portion comprises a hydrophobic material on an upper surface opposite the substrate. The method further comprises the following steps: spraying on the upper surfaces of the first and second portions a liquid comprising a transparent material, and forming a converging lens containing the material, above the first portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.