Method for producing solar cells having simultaneously etched-back doped regions

US9923116B2 · kind B2 · utility

Assignee

• University of Konstanz · DE

Inventors

• Josh Engelhardt · Konstanz, DE
• Alexander Frey · Lappersdorf, DE
• Yvonne Schiele · Konstanz, DE
• Barbara TERHEIDEN · Konstanz, DE

Key dates

• Filing date: Mar 11, 2015
• Grant date: Mar 20, 2018
• Expiry date: Mar 11, 2035

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P70/50

Abstract

A method for producing a solar cell is described, in which a plurality of doped regions are to be etched-back selectively or over their entire surface. Once a semiconductor substrate (1) has been provided, various doped regions (3, 5) are formed in partial regions of a surface of the semiconductor substrate, the various doped regions (3, 5) differing as regards their doping concentration and/or their doping polarity. The various doped regions (3, 5) are then purposively etched-back in order to achieve desired doping profiles, and finally electrical contacts (21) are formed at least at some of the doped regions (3, 5). The etching-back of the various doped regions takes place in a common etching operation in an etching medium. In order that such common etching-back of various doped regions (3, 5) is possible, it is proposed purposively to adjust both properties of the initially unetched doped regions (3, 5) and parameters that influence the etching operation with regard to properties of the desired doping profiles within the etched doped regions.