Nanoporous thin film and method for fabricating the same
US9925530B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 2015 |
| Grant date | Mar 27, 2018 |
| Priority date | — |
| Expiry date | Aug 27, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2305/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention relates to a nanoporous thin film and a method for fabricating the same. The nanoporous thin film fabricating method for fabricating a nanoporous thin film with a composite photocatalyst structure for a photodegradation and a water purification includes providing a porous substrate with a plurality of through-nanopores therein, each of which through-nanopores have an inner tube wall; forming an oxide-based photocatalyst layer over the porous substrate and the inner tube wall by using a first chemical-based deposition process; and forming a metal-based photocatalyst layer on a part of the oxide-based photocatalyst layer by using a second chemical-based deposition process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.