Environmental barrier for a refractory substrate containing silicon
US9926238B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 11, 2014 |
| Grant date | Mar 27, 2018 |
| Priority date | — |
| Expiry date | Jun 11, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T50/60
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A part including a substrate in which at least a portion adjacent to a surface of the substrate is made of a refractory material containing silicon, is protected by an environmental barrier formed on the surface of the substrate and having at least a self-healing layer containing a rare earth silicate. The self-healing layer is formed: for at least 90 mol %, by a system constituted by 30 mol % to at most 80 mol % of at least one rare earth silicate RE2Si2O7, RE being a rare earth, and at least 20 mol % to 70 mol % of manganese oxide MnO; and for at most 10 mol %, by one or more oxides other than MnO, having a eutectic point with SiO2 less than or equal to 1595° C.; the self-healing layer presenting a liquid phase having a self-healing function at least throughout the temperature range 1200° C. to 1400° C., while conserving a majority solid phase.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.