Vacuum drying apparatus and vacuum drying method using the same
US9927172B2 · kind B2 · utility
0Cited by
1References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 17, 2015 |
| Grant date | Mar 27, 2018 |
| Priority date | — |
| Expiry date | Feb 19, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2224/75102
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An embodiment of the present invention provides a vacuum drying apparatus and a vacuum drying method. The vacuum drying apparatus includes a chamber in which a substrate table is arranged, the chamber being provided with a wind deflector therein, wherein the wind deflector comprises a top opening, a bottom opening and a body part connecting the top opening with the bottom opening. During the vacuum drying, the bottom opening is in tight contact with a surface of the substrate table, and there is a gap between the top opening and the top of the chamber and a material on the substrate table is covered by the wind deflector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.