Plasma generation device
US9928992B2 · kind B2 · utility
0Cited by
18References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2016 |
| Grant date | Mar 27, 2018 |
| Priority date | — |
| Expiry date | Jun 1, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/22
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma generation device includes: a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair of electrodes; and a power source that includes a step-up transformer that has a coupling coefficient of 0.9 or greater and 0.9999 or less and generates the voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.