Patent · US Active

Methods for manufacturing photoelectrosynthetically active heterostructures

US9935234B2 · kind B2 · utility

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18Claims
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Key dates

Filing dateJan 27, 2017
Grant dateApr 3, 2018
Priority date
Expiry dateJan 27, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P20/133
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A photoelectrosynthetically active heterostructure (PAH) is manufactured by forming or providing cavities in an electrically insulating material; forming or providing an electrically conductive layer on a side of the electrically insulating material; depositing an electrocatalyst cathode layer in the cavities; depositing one or more layers of light-absorbing semiconductor material in the cavities; depositing an electrocatalyst anode layer in the cavities; removing the layer of electrically conductive metal; and forming a hydrogen permeable layer over the electrocatalyst cathode layer. The one or more layers of light-absorbing semiconductor material can form a p-n junction or Schottky junction. The PAH can be used in photoelectrosynthetic processes to produce desired products, such as reduction product (e.g., methane gas, methanol, or carbon monoxide) from carbon dioxide and liquid waste streams.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.