Chemical vapor deposition process for depositing a titanium oxide coating
US9938619B2 · kind B2 · utility
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5References
19Claims
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Key dates
| Filing date | Sep 9, 2015 |
| Grant date | Apr 10, 2018 |
| Priority date | — |
| Expiry date | Sep 9, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/1525
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition process for depositing a titanium oxide coating is provided. The chemical vapor deposition process for depositing the titanium oxide coating includes providing a glass substrate. A gaseous mixture is formed. The gaseous mixture includes a titanium-containing compound and a fluorine-containing compound. The titanium-containing compound is an oxygen-containing compound or the gaseous mixture includes a first oxygen-containing compound. The gaseous mixture is directed toward and along the glass substrate. The mixture reacts over the glass substrate to form the titanium oxide coating thereon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.