Laser beam pattern projector
US9939233B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2014 |
| Grant date | Apr 10, 2018 |
| Priority date | — |
| Expiry date | Apr 30, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/88
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems consistent with some embodiments presented provide methods for denying visual access to a first area from a target area. In some embodiments, methods for denying visual access from a target area may include generating a structured light pattern and projecting the structured light pattern from onto the target area. Reflections and retroreflections from the target area can indicate the presence of sensors. Characterization of one or more sensors in the target area based on the reflections and retroreflections can be performed. Parameters of the structured light pattern, such as color content, amplitude, pattern, and movement of the pattern, can be adjusted based on the type of sensor detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.