Method for producing a reflection-reducing layer system and reflection-reducing layer system

US9939556B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Ulrike Schulz · Jena, DE
• Friedrich Rickelt · Jena, DE
• Peter Munzert · Jena, DE
• Hanno Heiße · Jena, DE
• Heiko Knopf · Jena, DE
• Kevin Füchsel · Jena, DE
• Norbert Kaiser · Markt Taschendorf, DE

Key dates

• Filing date: Jan 27, 2016
• Grant date: Apr 10, 2018
• Expiry date: Jun 10, 2036

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B05D3/148
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.