Method for ensuring perfect stitching of a subject's images in a real-site image stitching operation
US9940695B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 26, 2016 |
| Grant date | Apr 10, 2018 |
| Priority date | — |
| Expiry date | Oct 15, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T7/337
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present invention is to provide a method for ensuring perfect stitching of a subject's images in a real-site image stitching operation, which enables an electronic device to read two real-site images which are taken respectively of different parts of the same site and each of which has an overlap area of a common subject; to determine and choose an optimal stitching path bypassing the subject; to construct a mask diagram such that, within a difference diagram of the overlap areas, the farther a pixel on one side of the optimal stitching path is from the optimal stitching path, the greater the pixel's value, and the farther a pixel on the other side of the optimal stitching path is from the optimal stitching path, the smaller the pixel's value; and to stitch and fuse the overlap areas together through a fusion algorithm, with the mask diagram serving as a weight.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.