Patent · US Active

Apparatus for processing work piece by pulsed electric discharges in solid-gas plasma

US9941102B2 · kind B2 · utility

3Cited by
7References
21Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 10, 2012
Grant dateApr 10, 2018
Priority date
Expiry dateSep 12, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32697
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Work piece processing is performed by pulsed discharges between an anode (2) and a magnetron sputtering cathode (1) in solid-gas plasmas using a chamber (2) containing the work piece (7). A system (12) maintains a vacuum in the chamber and another system (14) provides sputtering and reactive gases. The pulses are produced in a plasma pulser circuit including the anode and the cathode, the discharges creating gas and partially ionized solid plasma blobs (3) moving or spreading from a region at a surface of the cathode towards the work piece and the anode. A pulsed current comprising biasing pulses arises between the second electrodes. Biasing discharges are produced between the anode and the work piece when said plasma blobs have spread to regions at the anode and at the work piece so that the pulsed current is the current of these biasing discharges.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.