Patent · US Active

Wafer-to-wafer bonding structure

US9941243B2 · kind B2 · utility

206Cited by
9References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 24, 2017
Grant dateApr 10, 2018
Priority date
Expiry dateJan 24, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/365
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wafer-to-wafer bonding structure includes a first wafer including a first conductive pad in a first insulating layer and a first barrier layer surrounding a lower surface and side surfaces of the first conductive pad, a second wafer including a second conductive pad in a second insulating layer and a second barrier layer surrounding a lower surface and side surfaces of the second conductive pad, the second insulating layer being bonded to the first insulating layer, and at least a portion of an upper surface of the second conductive pad being partially or entirely bonded to at least a portion of an upper surface of the first conductive pad, and a third barrier layer between portions of the first and second wafers where the first and second conductive pads are not bonded to each other.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.