Apparatus for gas cleaning
US9943800B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 22, 2013 |
| Grant date | Apr 17, 2018 |
| Priority date | — |
| Expiry date | Dec 26, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B30/70
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention proposes an apparatus for gas cleaning having a high gas cleaning efficiency at any relative humidity. The apparatus comprises a passage (10) for gas flow; a hydrophilic carrier (12) permeable for gas flow, at least part of which is positioned within said passage for gas flow, and configured for containing a reagent that contacts the gas in said passage for gas flow; a unit (14) for disposing liquid to said carrier; and a controller (16), associated with said unit for disposing liquid, configured for controlling the unit for disposing to dispose an aqueous solution of dissolved reagent to the carrier; and after that controlling the unit for disposing to dispose liquid in case the humidity of the gas is below a first humidity threshold, or to stop disposing liquid in case the humidity of the gas is above a second humidity threshold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.