Method and apparatus for modeling microseismic event location estimate accuracy
US9945970B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2012 |
| Grant date | Apr 17, 2018 |
| Priority date | — |
| Expiry date | Jul 7, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V1/288
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates generally to microseismic event analysis, and more particularly to a method and apparatus for modeling microseismic event location estimate accuracy. According to certain aspects, the present invention provides a framework for analytically studying microseismic source location estimation accuracy and further provides new geometric intuitions and quantitative relationships that aid in the understanding of this problem. These intuitions and expressions can be shown to be in agreement with current observations in the state of the art.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.