Patent · US Active

Process for producing a scattering layer for electromagnetic radiation and scattering layer for scattering electromagnetic radiation

US9945989B2 · kind B2 · utility

3Cited by

4References

17Claims

0Family size

Assignee

Osram OLED GMBH · DE

Inventors

Daniel Steffen Setz · Eppelheim, DE
Manfred Deisenhofer · Burgau, DE
Angela Eberhardt · Augsburg, DE
Christina Wille · Friedberg, DE

Key dates

Filing date	Apr 11, 2013
Grant date	Apr 17, 2018
Priority date	—
Expiry date	Jul 12, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH10K50/854
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Various embodiments may relate to a process for producing a scattering layer for electromagnetic radiation. The process may include applying scattering centers onto a carrier, applying glass onto the scattering centers, and liquefying of the glass so that a part of the liquefied glass flows between the scattering centers toward the surface of the carrier, in such a way that a part of the liquefied glass still remains above the scattering centers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.