Method for forming metal mesh pattern and touch panel
US9946426B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | Nov 28, 2014 |
| Grant date | Apr 17, 2018 |
| Priority date | — |
| Expiry date | Apr 23, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2203/04112
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for forming a metal mesh pattern is provided. The method includes the operations below. First, at least one pitch of each of mesh base units of a mesh base is determined, and thereby the mesh base is formed. Then, a seed region is set in each of the mesh base units of the mesh base, in which a ratio of an area of each of the seed regions to an area of each of the mesh base units is a constant. Then, a plurality of seeds are generated by randomly selecting a point in each of the seed regions. Finally, the metal mesh pattern is formed, in which the metal mesh pattern is a set of perpendicular bisectors of lines connecting the seeds and their adjacent neighboring seeds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.