Guard ring structure and method for forming the same
US9947627B2 · kind B2 · utility
1Cited by
4References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 20, 2016 |
| Grant date | Apr 17, 2018 |
| Priority date | — |
| Expiry date | Jun 20, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/221
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A guard ring structure having a semiconductor substrate with a circuit region encircled by a first ring and a second ring. At least one of the first and second ring includes: a plurality of separated doping regions formed in various top portions of the semiconductor substrate, providing P-N junction or N-P junction on bottom of the plurality of separated doping regions; and an interconnect element formed over the semiconductor substrate, covering at least portion of the plurality of separated doping regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.