Patent · US Active

Method and device for process monitoring

US9952236B2 · kind B2 · utility

7Cited by
8References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 11, 2012
Grant dateApr 24, 2018
Priority date
Expiry dateMar 13, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P10/25
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Disclosed is a method for monitoring a generative fabrication process in which a component is formed in an installation space from a multiplicity of layers by using a three-dimensional data model and a following layer is fixed to a preceding layer by means of a high-energy beam. The method comprises detecting the component at least optically and detecting the installation space thermally during layer application. Also disclosed is a device for carrying out the method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.