Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same
US9957614B2 · kind B2 · utility
1Cited by
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12Claims
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Key dates
| Filing date | May 26, 2015 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | May 26, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure relates to a novel ruthenium compound, a method for preparing the ruthenium compound, a precursor composition for depositing a ruthenium-containing film including the ruthenium compound, and a method for depositing a ruthenium-containing film by using the precursor composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.