Imprint apparatus and method of manufacturing article
US9958773B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2015 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Dec 25, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7042
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an imprint apparatus which forms an imprint material on a substrate using a mold, comprising a driving unit driving at least one of the mold and the substrate, a measurement unit measuring a position deviation amount between the mold and the substrate, and a control unit controlling alignment between the mold and the substrate based on the position deviation amount, wherein in a first period from a start of contact between the mold and the imprint material until a distance between the mold and the substrate falls within a target range, and a second period in which the distance is maintained, the control unit obtains a command value for controlling the driving unit and controls the driving unit such that a amplification factor of the command value in the second period is larger than that in the first period.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.