Simulation and skinning of heterogeneous texture detail deformation
US9959662B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 10, 2014 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Jun 27, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2210/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method is disclosed for reducing distortions introduced by deformation of a surface with an existing parameterization. In an exemplary embodiment, the method comprises receiving a rest pose mesh comprising a plurality of faces, a rigidity map corresponding to the rest pose mesh, and a deformed pose mesh; using the rigidity map to generate a simulation grid on the rest pose mesh, the simulation grid comprising a plurality of cells; defining a set of constraints on the simulation grid, the constraints being derived at least in part from the rigidity map; running a simulation using the simulation grid and the set of constraints to obtain a warped grid; and texture mapping the deformed pose mesh based on data from the warped grid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.