Activation method for silicon substrates comprising at least two aromatic acids
US9960051B2 · kind B2 · utility
2Cited by
7References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2016 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Mar 18, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C18/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to an activation composition for activation of silicon substrates, which is an aqueous solution comprising a source of palladium ions, a source of fluoride ions and at least two aromatic acids. The present invention further relates to a method for its use and optionally for subsequent metallization of such treated substrates. The method can be employed in semiconductor and solar cell manufacturing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.