Patent · US Active

Method of producing an optoelectronic device and optoelectronic device

US9960390B2 · kind B2 · utility

46Cited by
0References
14Claims
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Inventors

Key dates

Filing dateAug 27, 2014
Grant dateMay 1, 2018
Priority date
Expiry dateDec 26, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K2102/00

Abstract

A method of producing an optoelectronic device includes A) providing a substrate, B) applying a first electrode to the substrate, C) applying a first organic layer stack to the first electrode, D) producing a charge-generating layer stack on the first organic layer stack, E) applying a second organic layer stack to the charge-generating layer stack, and F) applying a second electrode to the second organic layer stack, wherein step D) includes D1) applying a solution of a first metal oxide precursor to the first organic layer stack, D2) generating a first charge-generating layer comprising a first metal oxide, D3) applying a solution of a second metal oxide precursor to the first charge-generating layer, and D4) generating a second charge-generating layer comprising a second metal oxide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.