Method of forming catalyst layer by single step infiltration
US9960428B1 · kind B1 · utility
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Key dates
| Filing date | Jul 13, 2016 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Oct 12, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01M2008/1293
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided herein is a method for electrocatalyst infiltration of a porous substrate, of particular use for preparation of a cathode for a solid oxide fuel cell. The method generally comprises preparing an electrocatalyst infiltrate solution comprising an electrocatalyst, surfactant, chelating agent, and a solvent; pretreating a porous mixed ionic-electric conductive substrate; and applying the electrocatalyst infiltration solution to the porous mixed ionic-electric conductive substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.