Solvent resistant, aromatic polyamide films for transparent flexible substrates
US9963548B1 · kind B1 · utility
2Cited by
8References
12Claims
0Family size
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Key dates
| Filing date | Apr 23, 2013 |
| Grant date | May 8, 2018 |
| Priority date | — |
| Expiry date | Apr 23, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D177/10
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Solvent resistant, transparent films prepared from solutions of aromatic polyamides and multi-functional carboxylic acids in polar aprotic solvents are described herein. Solvent resistance is achieved by heating the films for a short time above 300° C. near the polyamide Tg. The films have CTEs less than 40 ppm/° C. and are optically clear displaying transmittance above 75% between 400 and 750 nm. The films are useful as substrates for flexible electronic devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.