Method of fabricating conductive thin film
US9966168B1 · kind B1 · utility
1Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Dec 28, 2016 |
| Grant date | May 8, 2018 |
| Priority date | — |
| Expiry date | Dec 28, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T442/655
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method of fabricating a conductive thin film includes the following steps: forming a polymer fiber made of a polymer and a metal precursor distributed in a surface layer near the surface of the polymer fiber; and applying a plasma treatment on the polymer fiber to concurrently etch the polymer and reduce the metal precursor in the surface layer of the polymer fiber. When the plasma treatment is completed, a metal membrane is formed on the surface of the polymer fiber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.