Contrast pattern application for three-dimensional imaging
US9968524B2 · kind B2 · utility
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4References
9Claims
0Family size
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Key dates
| Filing date | Dec 22, 2016 |
| Grant date | May 15, 2018 |
| Priority date | — |
| Expiry date | Dec 22, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/30
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
Provided herein are compositions for applying a reference marker pattern or grid to the surface of an object to be imaged three-dimensionally. These compositions can be quick drying for ease of use. Methods of use of the compositions are also provided as well as devices and kits for the application of the compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.