Method for fabricating photoresist pattern, color filter and display device
US9971187B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 2, 2016 |
| Grant date | May 15, 2018 |
| Priority date | — |
| Expiry date | May 9, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133519
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure provides in some embodiments a method for fabricating a photoresist pattern, a color filter and a method for fabricating the same, and a display device. The method for fabricating a photoresist pattern includes coating negative photoresist on a base substrate to form a first photoresist layer, coating positive photoresist on the first photoresist layer to form a second photoresist layer, conducting a first exposure process on first regions of the second photoresist layer, conducting a first developing process to remove the positive photoresist within the first regions of the second photoresist layer and the negative photoresist within second regions of the first photoresist layer, so as to obtain a first photoresist pattern and a second photoresist pattern, conducting a second exposure process on the first photoresist pattern and the second photoresist pattern, and conducting a second developing process to remove the first photoresist pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.