Etching time detection means and method for etching device
US9972546B2 · kind B2 · utility
1Cited by
4References
9Claims
0Family size
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Key dates
| Filing date | Mar 12, 2013 |
| Grant date | May 15, 2018 |
| Priority date | — |
| Expiry date | Nov 8, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An etching time detection means and an etching time detection method for an etching device. The detection means comprises: a light wave emitter fixed on one substrate of the etching device, a light wave receiver fixed on another substrate and opposed to the light wave emitter, a detection system communicated with the light wave emitter and the light wave receiver for receiving light intensity signals and calculating etching time. With the detection means and the detection method, the automatical detection of etching time can be achieved and the deviation caused by visual observation can be effectively avoided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.