Power supply device and method for plasma generation
US9974154B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 25, 2016 |
| Grant date | May 15, 2018 |
| Priority date | — |
| Expiry date | Jun 14, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/24
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A power supply device includes: an oscillation unit for outputting a high frequency signal; a modulation unit for outputting a pulsed high frequency signal; a level adjustment unit for adjusting and outputting a level of the pulsed high frequency signal; a power amplifier for amplifying a power outputted from the level adjustment unit; an output power detection unit for detecting an output power value from the power amplifier; and a control unit. The control unit corrects and outputs a level control signal for controlling the level of the pulsed high frequency signal based on a corresponding correction factor at each of elapsed times in an on state of the pulsed high frequency signal, and compares comparison values in a current pulse and a previous pulse to update the correction factor such that comparison result between the set power value and the output power value becomes smaller at each reflection coefficient.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.