Patent · US Active

Chemical vapor deposition functionalization

US9975143B2 · kind B2 · utility

13Cited by
31References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 14, 2014
Grant dateMay 22, 2018
Priority date—
Expiry dateNov 25, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09D5/08
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.