Process for controlling the period of a nanostructured block copolymer film based on styrene and on methyl methacrylate, and nanostructured block copolymer film
US9976053B2 · kind B2 · utility
0Cited by
4References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2015 |
| Grant date | May 22, 2018 |
| Priority date | — |
| Expiry date | Jun 1, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2333/08
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.