Lithography apparatus, and method of manufacturing article
US9977346B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2017 |
| Grant date | May 22, 2018 |
| Priority date | — |
| Expiry date | Feb 9, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.