Method for repairing oxide thin film and oxide thin-film device
US9978592B2 · kind B2 · utility
0Cited by
2References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 12, 2016 |
| Grant date | May 22, 2018 |
| Priority date | — |
| Expiry date | Apr 12, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/80
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed is a method for repairing an oxide thin film, including repairing the oxide thin film by forming a repairing material that contains an oxide at a defect of the oxide thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.