Transistors having offset contacts for reduced off capacitance
US9978747B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 30, 2016 |
| Grant date | May 22, 2018 |
| Priority date | — |
| Expiry date | Sep 30, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/181
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Systems, apparatuses and methods for reduced OFF capacitance in switching devices are disclosed. A transistor stack includes first and second doped regions serving as a source and drain, respectively of a transistor, an elongated gate structure including a first gate structure disposed between the first and second regions and serving as a gate of the transistor, a first set of electrical contact pads disposed on the first region, and a second set of electrical contact pads disposed on the second region, the second set of contact pads having an offset position with respect to the first set of contact pads in a longitudinal direction of the first and second regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.