Stripper composition for removing photoresists and method for stripping photoresists using the same
US9983481B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2015 |
| Grant date | May 29, 2018 |
| Priority date | — |
| Expiry date | Sep 16, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.