Replicating the appearance of typographical attributes by adjusting letter spacing of glyphs in digital publications
US9984053B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 10, 2014 |
| Grant date | May 29, 2018 |
| Priority date | — |
| Expiry date | Mar 10, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F40/109
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Techniques are disclosed for replicating the appearance of typographical attributes and text adornments in digital publications. Content in a fixed layout format is converted into a standard digital publication format by applying a <span> tag to each word of the content. Each <span> tag includes a CSS letter spacing attribute that is calculated based on the effective width of each glyph forming the word in the fixed layout format, and the default width of the same glyph in the digital publication format. In this manner, the corresponding word is rendered in approximately the same space in both the fixed layout and digital publication formats.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.