Patent · US Active

Optical system for producing lithographic structures

US9989862B2 · kind B2 · utility

2Cited by

2References

20Claims

0Family size

Assignee

Carl Zeiss AG · DE

Inventors

Philipp Huebner · Hamburg, DE
Gerhard Krampert · Jena, DE
Stefan Richter · Seattle, US
Timo Mappes · Karlsruhe, DE

Key dates

Filing date	Apr 4, 2017
Grant date	Jun 5, 2018
Priority date	—
Expiry date	Apr 4, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7011
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system for producing lithographic structures is disclosed. Also disclosed is a method for determining relative coordinates of a position of a writing field relative to a position of a preview field in such an optical system, and a method for producing lithographic structures using such an optical system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.