Dual active layer semiconductor device and method of manufacturing the same
US9991311B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2015 |
| Grant date | Jun 5, 2018 |
| Priority date | — |
| Expiry date | Mar 9, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/10128
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Some embodiments include an imaging system. The imaging system includes an active matrix pixel array having a flexible substrate and a pixel. The pixel includes a transistor over the flexible substrate, and the transistor includes multiple active layers having a first active layer and a second active layer over the first active layer. Further, the active matrix pixel array also includes a photodiode over the transistor, and the photodiode includes an N-type layer over the transistor, an I layer over the N-type layer, and a P-type layer over the I layer. Meanwhile, the imaging system also includes a flexible scintillator layer over the active matrix pixel array. Other embodiments of related systems and methods are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.