Patent · US Active

Thin film transition metal dichalcogenides and methods

US9991390B2 · kind B2 · utility

1Cited by
1References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 30, 2015
Grant dateJun 5, 2018
Priority date
Expiry dateSep 30, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B29/46
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A coated substrate including a thin film of a transition metal dichalcogenide and associated methods are shown. In one example, the substrate is a semiconductor wafer. In one example, the thin film is atomically thin, and the substrate is a number of centimeters in diameter. In one example a crystalline structure of the thin film is substantially 2H hexagonal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.