Thin film transition metal dichalcogenides and methods
US9991390B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Sep 30, 2015 |
| Grant date | Jun 5, 2018 |
| Priority date | — |
| Expiry date | Sep 30, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/46
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coated substrate including a thin film of a transition metal dichalcogenide and associated methods are shown. In one example, the substrate is a semiconductor wafer. In one example, the thin film is atomically thin, and the substrate is a number of centimeters in diameter. In one example a crystalline structure of the thin film is substantially 2H hexagonal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.