Cleaning industrial plant components to remove metal halides

US9994802B2 · kind B2 · utility

Assignee

• Wacker Chemie AG · DE

Inventors

• Javad Mohsseni · Bitterfeld-Wolfen, DE
• Konrad Mautner · Burghausen, DE
• Peter Nuernberg · Riesa, DE
• Christian Kaltenmarkner · Burghausen, DE
• Klaus Kaeppler · Burghausen, DE
• Andreas Bockholt · Munich, DE

Key dates

• Filing date: Mar 25, 2015
• Grant date: Jun 12, 2018
• Expiry date: May 25, 2036

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D2111/20
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Cleaning industrial plant components to remove silane, metal halide, and organometallic halide contaminants and mixtures thereof, involves treating the plant components with a liquid nitrile or amine or mixture thereof or with a solution of a nitrile or amine or mixture thereof in an aprotic solvent.