Reticle and exposure apparatus including the same
US9996001B2 · kind B2 · utility
0Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2016 |
| Grant date | Jun 12, 2018 |
| Priority date | — |
| Expiry date | Sep 12, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reticle including a mask and an edge cover may be provided. The mask may include a mask substrate and mask patterns on the mask substrate. The edge cover may be coupled to an edge of the mask substrate and may include a floating cover part. The floating cover part may be spaced apart from the mask patterns while extending from a sidewall of the mask substrate over the mask patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.