Method for manufacturing a superhydrophobic surface, surface so obtained and use of it
US9999901B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 2, 2013 |
| Grant date | Jun 19, 2018 |
| Priority date | — |
| Expiry date | Jan 25, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24355
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness Ra between 0.1 and 1.0 μm and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W·cm−2. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet “sticking” properties (high water sliding angle).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.